JPH0314171B2 - - Google Patents

Info

Publication number
JPH0314171B2
JPH0314171B2 JP6302282A JP6302282A JPH0314171B2 JP H0314171 B2 JPH0314171 B2 JP H0314171B2 JP 6302282 A JP6302282 A JP 6302282A JP 6302282 A JP6302282 A JP 6302282A JP H0314171 B2 JPH0314171 B2 JP H0314171B2
Authority
JP
Japan
Prior art keywords
photosensitive material
substrate
bottom plate
spinner head
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6302282A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58178358A (ja
Inventor
Muneo Hatsuta
Hayaaki Fukumoto
Masahiro Yoneda
Kazuo Mizuguchi
Wataru Wakamya
Junichi Mihashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6302282A priority Critical patent/JPS58178358A/ja
Publication of JPS58178358A publication Critical patent/JPS58178358A/ja
Publication of JPH0314171B2 publication Critical patent/JPH0314171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6302282A 1982-04-13 1982-04-13 感光性材料塗布装置 Granted JPS58178358A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6302282A JPS58178358A (ja) 1982-04-13 1982-04-13 感光性材料塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6302282A JPS58178358A (ja) 1982-04-13 1982-04-13 感光性材料塗布装置

Publications (2)

Publication Number Publication Date
JPS58178358A JPS58178358A (ja) 1983-10-19
JPH0314171B2 true JPH0314171B2 (en]) 1991-02-26

Family

ID=13217275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6302282A Granted JPS58178358A (ja) 1982-04-13 1982-04-13 感光性材料塗布装置

Country Status (1)

Country Link
JP (1) JPS58178358A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008056827A1 (en) 2006-11-09 2008-05-15 Mitsubishi Rayon Co., Ltd. Process for production of betaine

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6096822U (ja) * 1983-12-09 1985-07-02 沖電気工業株式会社 スピナ−ヘツド

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008056827A1 (en) 2006-11-09 2008-05-15 Mitsubishi Rayon Co., Ltd. Process for production of betaine

Also Published As

Publication number Publication date
JPS58178358A (ja) 1983-10-19

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